| Emission source
| Applicability
| Requirement
|
|---|
| Process vents | Existing:
| |
| | Processes having uncontrolled organic HAP emissions ≥0.15 Mg/yr | 90% for organic HAP per process or to outlet concentration of ≤20 ppmv TOC.
|
| | Processes having uncontrolled HCl and chlorine emissions ≥6.8 Mg/yr | 94% for HCl and chlorine per process or to outlet HCl and chlorine concentration of ≤20 ppmv.
|
| | Individual process vents meeting flow and mass emissions criteria that have gaseous organic HAP emissions controlled to less than 90% on or after November 10, 1997 | 98% gaseous organic HAP control per vent or ≤20 ppmv TOC outlet limit.
|
| | New:
| |
| | Processes having uncontrolled organic HAP emissions ≥0.15 Mg/yr | 98% for organic HAP per process or ≤20 ppmv TOC.
|
| | Processes having uncontrolled HCl and chlorine emissions ≥6.8 Mg/yr and <191 Mg/yr | 94% for HCl and chlorine per process or to outlet concentration of ≤20 ppmv HCl and chlorine.
|
| | Processes having uncontrolled HCl and chlorine emissions ≥191 Mg/yr | 99% for HCl and chlorine per process or to outlet concentration of ≤20 ppmv HCl and chlorine.
|
| Storage vessels | Existing: ≥75 m
3 capacity and vapor pressure ≥3.45 kPa | Install a floating roof, reduce HAP by 95% per vessel, or to outlet concentration of ≤20 ppmv TOC.
|
| | New: ≥38 m
3 capacity and vapor pressure ≥16.5 kPa | Same as for existing sources.
|
| | ≥75 m
3 capacity and vapor pressure ≥3.45 kPa | Same as for existing sources.
|
| Wastewater
a | Existing: Process wastewater with ≥10,000 ppmw Table 9 compounds at any flowrate or ≥1,000 ppmw Table 9 compounds at ≥10 L/min, and maintenance wastewater with HAP load ≥5.3 Mg per discharge event | Reduce concentration of total Table 9 compounds to <50 ppmw (or other options).
|
| | New:
| |
| | Same criteria as for existing sources | Reduce concentration of total Table 9 compounds to <50 ppmw (or other options).
|
| | Total HAP load in wastewater POD streams ≥2,100 Mg/yr. | 99% reduction of Table 9 compounds from all streams.
|
| Equipment leaks | Subpart H | Subpart H with minor changes, including monitoring frequencies consistent with the proposed CAR.
|
| Product dryers and bag dumps | Dryers used to dry PAI that is also a HAP, and bag dumps used to introduce feedstock that is a solid and a HAP | Particulate matter concentration not to exceed 0.01 gr/dscf.
|
| Heat exchange systems | Each heat exchange system used to cool process equipment in PAI manufacturing operations | Monitoring and leak repair program as in HON.
|